Pattern Recognition and Artificial Intelligence: International Conference, ICPRAI 2020, Zhongshan, China, October 19-23, 2020, Proceedings

Pattern Recognition and Artificial Intelligence: International Conference, ICPRAI 2020, Zhongshan, China, October 19-23, 2020, Proceedings

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2020 · 영어 · 킨들 · 2 editions
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The proceedings from the Second International Conference on Pattern Recognition and Artificial Intelligence held in Zhongshan, China, offer a comprehensive collection of cutting-edge research and advancements in the field. Featuring contributions from esteemed researchers including Yue Lu and Nicole Vincent, this compilation showcases innovative approaches to pattern recognition and the utilization of artificial intelligence technologies.

The work delves deep into various methodologies, applications, and theoretical perspectives that are shaping the future of these disciplines. With the inclusion of diverse topics, it serves as an invaluable resource for academics and professionals alike, providing insights that are both timely and relevant in a rapidly evolving technological landscape.

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형식 킨들
페이지 1,313 페이지
언어 영어
출판됨 Oct 9, 2020
출판사 Springer

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