Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications

아직 평점이 없습니다
2013 · 영어 · 하드커버 · 판본 4개
서가에 추가

이 책 평가하기


도서 일지 내보내기

설명

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

책 세부 정보

형식 하드커버
페이지 272 페이지
언어 영어
출판됨 May 28, 2013
출판사 Wiley-Scrivener
ISBN-10 1118062779
ISBN-13 9781118062777
서가에 추가

이 책 평가하기


도서 일지 내보내기