描述
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
书籍详情
格式
精装书
页数
272 页
语言
英语
已发布
May 28, 2013
出版商
Wiley-Scrivener
版本
4 个版本
ISBN-10
1118062779
ISBN-13
9781118062777