Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

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1997 · Angielski · Kindle
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Opis

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

Szczegóły książki

Format Kindle
Strony 311 stron
Język Angielski
Opublikowany lis 14, 1997
Wydawca Academic Press
ISBN-10 0080542905
ISBN-13 9780080542904
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