Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

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Nov 14, 1997 · English · Kindle (311 pages)
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Book Details

Format Kindle
Pages 311
Language English
Published Nov 14, 1997
Publisher Academic Press
ISBN-10 0080542905
ISBN-13 9780080542904

Description

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.
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